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Title of Journal: Plasma Chem Plasma Process

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Abbravation: Plasma Chemistry and Plasma Processing

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Springer US

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DOI

10.1016/0167-7152(90)90071-e

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1572-8986

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MgO Erosion Profile in the High Pressure Coplanar

Authors: Seung Min Lee Sung Soo Yang Young Sik Seo Jae Koo Lee
Publish Date: 2007/07/26
Volume: 27, Issue: 4, Pages: 349-358
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Abstract

The sputtering of the MgO protective layer by energetic ions is one of the factors limiting the lifetime of the plasma display panels PDPs The sputtering profile of the MgO layer in a coplanar PDP cell has been studied using twodimensional particleincell MonteCarlo Collision PIC–MCC simulations The sputtering profile of the MgO layer for various gas conditions is obtained accounting for the energy and angle distributions of different ion species and their respective sputtering yields Based on the simulation results the MgO layer is more aggressively sputtered in Nebased discharges than in Hebased discharges As a result it is expected that the addition of He to the NeXe mixture in PDPs will reduce the sputtering of the MgO layer and extend the lifetime of the PDP cells

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