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Title of Journal: Plasma Chem Plasma Process

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Abbravation: Plasma Chemistry and Plasma Processing

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Springer US

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DOI

10.1016/0014-4827(74)90407-8

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1572-8986

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Hydroxyl Radicals Formation in Dielectric Barrier

Authors: Xiaobin Liao Yufang Guo Jianhua He Weijian Ou Daiqi Ye
Publish Date: 2010/10/05
Volume: 30, Issue: 6, Pages: 841-853
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Abstract

A method based on high performance liquid chromatography HPLC has been developed to measure hydroxyl radical ·OH in plasma reactors The determination was performed indirectly by detecting the products of the reaction of ·OH with salicylic acid SAL The applicability and effect of time specific input energy SIE relative humidity RH catalyst were investigated It was found that 3 h was the optimal trapping time concentration of ·OH was 59–236 × 1013 radicals/cm3 at SIE range The highest ·OH yield and toluene removal efficiency η were achieved with a RH of 20 With MnO x η was two times that without catalyst while ·OH yield in gas stream was onesixth that without catalyst However if summed with ·OH adsorbed on catalyst surface the total ·OH yield was the same as without catalyst Experiments performed with/without toluene allowed to determine the role of ·OH on decomposition of toluene in air plasmaThis work was supported by the Doctoral Program of Higher Specialized Research Fund 20070561042 National High Technology Research and Development Program of China No 2006AA06A310 the National Natural Science Foundation of China No 50978103 No 50708021 the Guangzhou University Xinmiao Project No gyf11001 and the Guangzhou University Scientific Research Startup Project No gyf11002 In addition key laboratory of environmental protection and ecoremediation of Guangdong regular higher education institutions was gratefully acknowledged


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