Authors: G L Doll B A Mensah H Mohseni T W Scharf
Publish Date: 2009/08/11
Volume: 19, Issue: 1-2, Pages: 510-516
Abstract
Chemical vapor deposition CVD of films and coatings involves the chemical reaction of gases on or near a substrate surface This deposition method can produce coatings with tightly controlled dimensions and novel structures Furthermore the nonlineofsightdeposition capability of CVD facilitates the coating of complexshaped mechanical components Atomic layer deposition ALD is also a chemical gas phase thin film deposition technique but unlike CVD it utilizes “selflimiting” surface adsorption reactions chemisorption to control the thickness of deposited films This article provides an overview of CVD and ALD discusses some of their fundamental and practical aspects and examines their advantages and limitations versus other vapor processing techniques such as physical vapor deposition in regard to coatings for mechanical applications Finally sitespecific crosssectional transmission electron microscopy inside the wear track of an ALD ZnO/ZrO2 8 bilayers nanolaminate coating determined the mechanisms that control the friction and wearThis article is an invited paper selected from presentations at the 2009 International Thermal Spray Conference and has been expanded from the original presentation It is simultaneously published in Expanding Thermal Spray Performance to New Markets and Applications Proceedings of the 2009 International Thermal Spray Conference Las Vegas NV USA May 47 2009 Basil R Marple Margaret M Hyland YukChiu Lau ChangJiu Li Rogerio S Lima and Ghislain Montavon Ed ASM International Materials Park OH 2009
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