Authors: Tolecia S Clark Charles E Hoyle Sergei Nazarenko
Publish Date: 2008/04/05
Volume: 5, Issue: 3, Pages: 345-351
Abstract
The kinetics and thermal/physical properties of the trithiolTAE triallyl ether system were measured with respect to increasing polyoligomeric silsesquioxane POSS concentrations in order to understand how the presence of POSS nanoparticles affects network formation at low loadings Vinyl POSS monomer vPOSSBu4 with both vinyl and carboxylate pendant groups was synthesized via a thermally initiated freeradical reaction to improve the compatibility of the inorganic particles with the trithiol and triallyl ether comomoners Chemically modified vPOSSBu4 particles were incorporated into the trithiolTAE polymer networks by a thiolene freeradical photopolymerization at molar concentrations of 0 1 and 5 ene mol The polymerization rates were analyzed using realtime FTIR and photoDSC The polymerization rates showed no significant changes with increasing vPOSSBu4 concentration Thermal analyses of the films by differential scanning calorimetry DSC and thermogravimetric analysis TGA demonstrated that thermal stability improves without affecting T g as the POSS concentration increased Additionally scratch resistance increased and flame spread decreased markedly with increasing POSS concentration for concentrations up to 5 mol vPOSSBu4
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