Authors: Yuliang Zhou Xungang Diao Guobo Dong Zhonghou Wu Dongmei Dong Mei Wang
Publish Date: 2015/11/18
Volume: 22, Issue: 1, Pages: 25-32
Abstract
ZrO2H thin films were deposited by DC magnetron sputtering at room temperature The effects of thickness on structure and morphologies of ZrO2H thin films were lucubrated The Xray photoelectron spectroscopy analysis reveals that the fully oxidized value of Zr Zr4+ exists in both ZrO2 and ZrO2H films Xray diffraction data show the crystallinity of ZrO2H thin films tends to be weak and the microstructure changes slightly Atomic force microscopy analysis presents that both the grain size and surface roughness increase as the thickness increases Correspondingly allthinfilm ITO/NiO x /ZrO2H/WO3/ITO electrochromic devices ECDs were monolithically fabricated among which the thickness of ZrO2H film was adjusted The ECD assembled with 50 nm ZrO2H film has the best electrochromic property with transmittance modulation ΔT of 652 at 550 nm The effects of operation potential on ECDs were also elaborated studied ECDs can get colored in saturated states at relatively high potential as no more unoccupied sites exist in WO3 to accommodate the continuously injected H+ ions
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