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Title of Journal: Korean J Chem Eng

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Abbravation: Korean Journal of Chemical Engineering

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Springer US

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DOI

10.1007/bf02557926

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1975-7220

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Effects of exposure wavelength and surface prepara

Authors: Moonchul Cho YeongBeom Lee
Publish Date: 2010/09/15
Volume: 27, Issue: 6, Pages: 1916-1921
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Abstract

We report a new factor for blister formation on organic photoresist PR and an improvement of this process We have studied blister formation from more different standpoints such as processes and instrumentation than did previous reports Unexpectedly we observed radical blister formation in an experiment that involved exposure without any ultraviolet UV filters After a series of experiments the data showed that the organic PR blister problem was most likely caused by the specific wavelength of the UV light field on exposure Surface preparations using wet and dry treatments prior to coating a thin film of organic PR on silicon nitride SiNx glass wafer were studied By comparing exposure to different spectra both with and without a UV filter we confirmed the key point of blister formation in case of the organic PR Additionally various treatments of SiNx prior to the coating of organic PR were primarily performed to improve organic PR adhesion to SiNx glass substrate

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