Authors: A U Ubale A N Bargal
Publish Date: 2010/12/23
Volume: 84, Issue: 11, Pages: 1497-1507
Abstract
This paper reports the preparation of photosensitive nanostructured CdS thin films by Successive Ionic Layer Adsorption and Reaction SILAR method at room temperature To obtain good quality CdS thin films preparative conditions such as concentration of cationic and anionic precursors adsorption and rinsing time durations etc are optimized The structural optical and electrical characterizations of the asdeposited and annealed CdS thin films were carried out using Xray diffraction scanning electron microscopy optical absorption and electrical resistivity methods The photoconductivity studies showed that the annealed films are more than that photosensitive The TEP measurement shows that deposited films are of ntype
Keywords: