Authors: M HierroOliva A M GallardoMoreno M L GonzálezMartín
Publish Date: 2014/09/19
Volume: 45, Issue: 13, Pages: 6285-6290
Abstract
Oxidation of Ti6Al4V is studied by Xray photoelectron spectroscopy XPS Oxide layer growth was monitored on the Ti6Al4V surface for 24 hours The surface was previously etched with Ar+ ions under ultrahigh vacuum conditions XPS spectra show that TiO and Ti2O3 together with Al2O3 were the earliest oxides formed Vanadium despite being detected in its elementary form in the bulk was not found in any of its oxidized states TiO2 directly related to the good performance of Ti6Al4V for biomedical applications did not contribute significantly to the passive layer at the beginning nevertheless it was identified after the oxidation process progressed to a more advanced stage This behavior indicates that reoxidation of Ti6Al4V permits autohealing of its passive layer with the presence of TiO2 even in conditions of low oxygen availabilityThis work was supported by Grants from the Ministry of Science and Innovation Grant MAT200914695CO4C01 and the Junta de ExtremaduraFEDER Grant GR10149 We thank the Servicio de Apoyo a la Investigación SAIUEx and the Surface Characterization and Calorimetry Platform of CIBERBBN for performing XPS measurements
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