Authors: Lingxiang Guo Jing Guan Baoping Lin Hong Yang
Publish Date: 2015/09/08
Volume: 22, Issue: 9, Pages: 3296-3301
Abstract
The matrix polymer PTBCHNB bearing onitrobenzyl group was successfully synthesized by copolymerization of tertiarybutyl methacrylate TBMA cyclohexyl methacrylate CHMA and onitrobenzyl methacrylate NBMA via reversible addition fragmentation chain transfer RAFT polymerization method PTBCHNB was characterized by FTIR 1HNMR GPC and DSC After UV irradiation the onitrobenzyl groups of PTBCHNB were photocleaved and the resulting carboxyl groups were highly alkali soluble and PTBCHNB was converted to PCHIBMA bearing carboxyl groups So the matrix polymer could be etched by mild alkali solution with no requirements of photoacid generators and other diverse additives The photocleavable behaviors of PTBCHNB were determined by FTIR 1H NMR and TGA analysis The resist formulated with PTBCHNB and cast in THF solution showed square pattern of 10 μm×10 μm using a mercuryxenon lamp in a contact printing mode and tetramethylammonium hydroxide aqueous solution as a developerFoundation item Project2008AA03323 supported by the HighTech Research and Development of China Project21374016 supported by the National Natural Science Foundation of China ProjectBY201153 supported by Production ForwardLooking Joint Research Project of Jiangsu Province China
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