Authors: Tae Woo Lim DongYol Yang
Publish Date: 2015/10/01
Volume: 16, Issue: 11, Pages: 2427-2431
Abstract
In this paper we study the accumulated polymerization effect in the twophoton stereolithography process and its application In the twophoton stereolithography process lesspolymerized material by insufficient dosing is generally removed by rinse material The lesspolymerized region of a voxel transforms into a fullypolymerized region in the voxelbyvoxel scanning process due to the accumulated dose The parametric study of the accumulation effect for the widths of a voxel and a line pattern is investigated Generally accumulated polymerization from the scanning process has an influence on the increase of the pattern width smoothness of the space between each voxel At a dose that is smaller than the dose generating a minimum size voxel stochastic nanopatterns are generated by fitfully accumulated twophoton polymerization Using the method of fitfully accumulated twophoton polymerization at a small dose 3D microstructures with nanopatterns are directly fabricated
Keywords: