Authors: G V Sharonov A P Bolshakov V G Ralchenko N M Kazuchits S A Petrov
Publish Date: 2010/11/12
Volume: 77, Issue: 5, Pages: 658-662
Abstract
The prospects for use of CVDtechnology for epitaxial growth of singlecrystal diamond films of instrumental quality in UHF plasma for the production of optoelectronic devices are discussed A technology for processing diamond single crystals that provides a perfect surface crystal structure with roughness less than 05 nm was developed It was demonstrated that selective UV detectors based on synthetic singlecrystal diamond substrates coated with singlecrystal films can be produced A criterion for selecting clean and structurally perfect single crystals of synthetic diamond was developed for the epitaxial growth technology
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