Authors: Jingcheng Liu Xiangfei Zheng Hu Li Ren Liu Qidao Mu Xiaoya Liu
Publish Date: 2014/12/17
Volume: 72, Issue: 3, Pages: 523-533
Abstract
A series of novel branched methacrylate copolymers BPMBMV were synthesized via the mercapto chain transfer polymerization using methacrylic acid maleic anhydride benzyl methacrylate and 4vinyl benzyl thiol Then BPMBMV reacted with hydroxyethyl acrylate to obtain branched UVcurable copolymer HBPMBMV which were characterized by fourier transfer infrared spectra and proton nuclear magnetic resonance spectra The molecular weights and glass transition temperature T g of the polymers decreased with the addition of VBT The results of photodifferential scanning calorimetry PhotoDSC tests showed that photopolymerization ability of HBPMBMV increased with the increased content of VBT With an optimized formulation a negativetype photoresist was prepared The resolution of the circuit could reach as high as 20 μm and the film of photoresist showed good acid resistance
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