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Title of Journal: J Solid State Electrochem

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Abbravation: Journal of Solid State Electrochemistry

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Springer-Verlag

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DOI

10.1002/chin.200807097

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1433-0768

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CdSe electrodeposition on anodic barrier or porou

Authors: T Kosanovic D Karoussos M Bouroushian
Publish Date: 2009/03/12
Volume: 14, Issue: 2, Pages: 241-
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Abstract

A variety of oxide layers from passive amorphous TiOx of few nanometer thicknesses to micrometerthick porous with different anatase to rutile ratios were prepared by potentiostatic or galvanostatic anodization of Ti metal in H2SO4 and HF/H3PO4 solutions and used as substrates for electrodeposition of cadmium selenide from acidic selenite baths The substrate and CdSe microstructures were investigated by Xray diffraction and electron microscopy techniques Barrier TiOx and heterogeneously structured oxide substrates induced growth of zinc blend/wurtzite CdSe whereas highly ordered porous titanium dioxide TiO2 accommodated growth of 100 oriented hexagonal CdSe thin layers Pulsed potential plating was employed to control porefilling during electrodeposition of CdSe Photoelectrochemical evaluation of the produced electrodes in polysulfide cell under green light illumination implied a TiO2 sensitization effect in the case of CdSe/porous TiO2/Ti system as evidenced by a negative shift in flat band potential and an increase in open circuit potential The sensitization effect was observed even with CdSe deposited by a single potential pulse signifying the importance of contacting the TiO2 surface to the electrolytic solution via a very thin layer of CdSe

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