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Title of Journal: J Solid State Electrochem

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Abbravation: Journal of Solid State Electrochemistry

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Springer-Verlag

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DOI

10.1007/s00127-016-1238-z

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1433-0768

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Deposition of amorphous chromium layers

Authors: Norbert Schröder Birgit Sonntag Waldfried Plieth
Publish Date: 2012/09/06
Volume: 16, Issue: 11, Pages: 3551-3558
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Abstract

Deposition of amorphous chromiumcarbon layers is possible from a trivalent chromium electrolyte containing 06 mol/l formic acid The formation of chromium/formic acid complexes inhibits the aging of the electrolyte and the oligomerization Deposition of a 15–20 μm thick chromium film is possible with DC condition Thicker films can be deposited with pulse plating using reversed pulse sequences and pulse lengths in the millisecond region The optimized conditions concerning pulse current densities and pulse times were determined and the composition and morphology of the films investigated

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  15. Development of nano IrO 2 composite-reinforced nickel–phosphorous electrodes for hydrogen evolution reaction
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