Authors: J W Leem Y M Song Y T Lee J S Yu
Publish Date: 2010/05/07
Volume: 99, Issue: 4, Pages: 695-700
Abstract
We fabricate the aluminumdoped zinc oxide AZO subwavelength gratings SWG on Si and glass substrates by holographic lithography and sequent CH4/H2/Ar reactive ion etching process The etch selectivity of AZO over photoresist mask as well as the nanoscale shape is optimized for better antireflection performance To analyze the antireflective properties of AZO SWG surface the optical reflectivity is measured and then calculated together with a rigorous coupledwave analysis The reflectance spectrum can be considerably changed by incorporating the SWG into AZO film As the SWG height of AZO on Si substrate increases the magnitude of interference oscillations in the reflectance spectrum tends to be reduced with the larger difference between its maxima The use of optimized SWG can significantly reduce the surface reflection of AZO film at the desired wavelengths The measured reflectance data of AZO SWG are reasonably consistent with the simulation results No considerable change in transmission characteristics is observed for AZO SWG structures
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