Authors: András Paszternák Meital Shviro David Zitoun
Publish Date: 2014/07/10
Volume: 16, Issue: 8, Pages: 2534-
Abstract
Deposition of nanoscale and smooth Ni film is challenging using wet chemistry Herein organometallic OM Ni precursor yields colloidal nanoparticles which selfassemble into thin metallic film with uniform thickness on large scale More precisely we report on the onepot synthesis and selfassembly of a monolayer of amorphous Ni nanoparticles on areas as large as 10 µm2 with a thickness as low as 10 nm and a roughness of 11 nm RMS Interestingly the reactivity of different complexes whether OM namely Ni η4–C8H122 or metal–organic namely Niacac2 orthogonally depends on whether the reaction is performed on a silicon wafer or in solution Only the combination of phosphine and amine ligands with OM precursor effectively controls the homogeneity of the film on large scale while phosphine ligands result in P doping of the amorphous Ni
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