Authors: Chiung Wei Lin Yi Liang Chen Yeong Shyang Lee
Publish Date: 2008/04/19
Volume: 20, Issue: 4, Pages: 301-304
Abstract
A porous silicon structure with good physical and optical characteristics was made by a novel method In this method an amorphous silicon film with many fine grains was used as micromask When the sample was subjected to etching process the presence of fine grain boundaries resulted in selective etching on the surface of silicon wafer The completed sample showed a lowreflective silicon wafer with a complex morphology When a light illuminated on this proposed structure there was nearly no optical reflection to be detected This indicates that the new porous silicon structure can act as a good lighttrapperThe authors thank the National Science Council NSC of the Republic of China Taiwan for the financial support of this research under contract number of NSC 962221E036038 And also thank the financial supports from Chunghwa Picture Tubes Ltd and Display Technique Center DTC industrial technology research institute ITRI contract numbers of 9268 and 9263 respectively
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