Authors: Jinhua Huang Ruiqin Tan Yulong Zhang Jia Li Ye Yang Xianpeng Zhang Weijie Song
Publish Date: 2011/11/29
Volume: 23, Issue: 2, Pages: 356-360
Abstract
In this work Aldoped 4 at ZnOAZO thin films were prepared by DC magnetron sputtering using a homemade ceramic target at different substrate temperatures The microstructure optical electrical and thermal stability properties of these thin films were characterized systematically using scanning electron microscopy UV–VisNIR spectrometry Xray diffraction and Hall measurements It was observed that the AZO thin films deposited at 350 °C exhibited the lowest resistivity of 576 × 10−4 Ω cm high average visible transmittance 400–800 nm of 92 and the best thermal stability Comparing with the AZO thin films deposited at low substrate temperatures the AZO thin films deposited at 350 °C had the highest compact surface morphology which could hinder the chemisorbed and diffused oxygen This was considered to be the main mechanism which was responsible for the thermal degradation of AZO thin filmsFinancial supports from the Hundred Talents Program the Solar Action Program and the Innovative Research International Partnership Program of Chinese Academy of Sciences the Ningbo Innovative Research Team Program the Ningbo Natural Science Foundation No 2009A610058 and No 2009A610018 and the Zhejiang Natural Science Foundation Y407364 are highly appreciated
Keywords: