Authors: V Madhav Kumar A Srinivas A Talapatra Saket Asthana J Mohanty S V Kamat
Publish Date: 2016/10/20
Volume: 28, Issue: 1, Pages: 446-453
Abstract
A systematic study about the variation in microstructure and magnetic properties of Cobalt ferrite thin films deposited on Si/SiO2/TiO2/Pt 111 substrate by using pulsed laser deposition at a constant oxygen pressure of 9 Pa with substrate temperatures ranging from 550 to 750 °C at an interval of 100 °C has been reported All films showed the 111 preferred orientation with single phase confirmed by grazing incidence Xray diffraction and Raman spectra Moreover the films showed all the active raman modes that were present in the cobalt ferrite target The films deposited at 550 and 650 °C exhibits uniform and smooth surface features whereas deposition at 750 °C gives rise to porosities and voids due to reevaporation of atoms from the deposited film The grain size and roughness of the films increased with increasing deposition temperature The induced inplane tension in the film due to thermal expansion mismatch between substrate and film causes the increase in the perpendicular magnetic anisotropy A sharp increase in outofplane coercivity and the domain size was observed at higher deposition temperatures
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