Authors: F Théberge SL Chin
Publish Date: 2004/01/21
Volume: 80, Issue: 7, Pages: 1505-1510
Abstract
We investigate the ablation process in SiO2 by the superposition of 180 fs laser pulse λcenter=800 nm with a 15 ns laser pulse λcenter=532 nm Compared to femtosecond laser pulses alone we measured an increase of 270±30 in volume of the ejected material with only a total increase of 40 of lasers fluences This increase of ablation is the result of thermal and incubation effects generated by the femtosecond laser pulse
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