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Title of Journal: Appl Phys A

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Abbravation: Applied Physics A

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Springer Berlin Heidelberg

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DOI

10.1002/lt.24417

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ISSN

1432-0630

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Chemistry and microstructure of PLD TiAlCSubsc

Authors: JM Lackner W Waldhauser R Ebner RJ Bakker
Publish Date: 2004/09/01
Volume: 79, Issue: 4-6, Pages: 1469-1471
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Abstract

The aim of the present work was the improvement of titaniumaluminium nitride TiAlN coatings by the solidsolution hardening with carbon atoms leading to titaniumaluminium carbonnitride TiAlCxN1x coatings with varying carbon x and nitrogen contents The request of low deposition temperatures necessary for the coating of heat sensitive materials like tool steels of high hardness and polymers was reached by the application of the room temperature pulsed laser deposition PLD technique A Nd  YAG laser of 1064 nm wavelength operated at two different laser pulse energies was used in the ablation experiments of pure TiAl targets 50 at  Al in various C2H2Ar gas mixtures Different pulse energies of the laser resulted in changes of the ratio of Ti/Al atoms in the grown coatings Furthermore the results reveal a strong proportionality of the gas mixture to the C and N content of the coatings In the coatings deposited at low C2H2 gas flows the XRD investigations showed crystalline phases with fcc TiN type lattices whereas high acetylene flows during deposition resulted in the formation of fully amorphous coatings and carbon precipitation or cluster boundaries found in Raman investigations

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