Authors: Zhihao Yue Honglie Shen Ye Jiang Wei Wang Jiale Jin
Publish Date: 2013/03/23
Volume: 114, Issue: 3, Pages: 813-817
Abstract
In this paper nickel nanoparticles Ni NPs were deposited on planar silicon and pyramidal silicon wafers by the magnetron sputtering method and then these Ni NPcovered samples were etched in a hydrofluoric acid hydrogen peroxide and deionized water mixed solution at room temperature to fabricate a low reflective silicon surface An alumina Al2O3 film was then deposited on the surface of the asetched pyramidal sample by atomic layer deposition to further reduce the reflectance The morphologies and compositions of these samples were studied by using a field emission scanning electron microscope attached to an energydispersive Xray spectrometer The surface reflectance measurements were carried out with a UVVisNIR spectrophotometer in a wavelength range of 200–1100 nm The SEM images show that the asetched planar and pyramidal silicon samples were covered with many rhombic nanostructures and that some nanostructures on the planar silicon surface were ready to exhibit a flowerlike burst The reflectances of the asetched planar and pyramidal silicon samples were 522 and 321 in the wavelength range of 400–800 nm respectively After being coated with a 75nmthick Al2O3 film the etched pyramidal silicon sample showed an even lower reflectance of 237 from 400 nm to 800 nmThis work is supported by the National Nature Science Foundation of China 61176062 funding from the Jiangsu Innovation Program for Graduate Education CXLX11 0191 and a project funded by the Priority Academic Program Development of Jiangsu Higher Education Institutions
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