Authors: K Hari Krishna O M Hussain C M Julien
Publish Date: 2010/04/15
Volume: 99, Issue: 4, Pages: 921-929
Abstract
Thin films of Tungsten trioxide WO3 were deposited on ITOcoated flexible Kapton substrates by plasmaassisted activated reactive evaporation ARE technique The influence of growth and microstructure on optoelectrochromic properties of WO3 thin films was studied The nanocrystalline WO3 films grown at substrate temperature of 250°C were composed of vertically elongated coneshaped grains of size 65 nm with relative density of 071 These WO3 films demonstrated higher optical transmittance of 85 in the visible region with estimated optical band gap of 339 eV and exhibited better optical modulation of 66 and coloration efficiency of 528 cm2/C at the wavelength of 550 nm
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