Authors: TW Kim T Kawazoe S Yamazaki M Ohtsu
Publish Date: 2005/02/01
Volume: 80, Issue: 5, Pages: 1049-1051
Abstract
Nanocrystalline ZnO films were fabricated via a simple method involving the oxidation of Zn films at a remarkably low temperature of 380 °C Xray diffraction study confirmed that the Zn films were completely oxidized even at the low temperature of 380 °C and the ZnO films fabricated were of polycrystalline wurtzite structure Room temperature optical pumping using a frequencyquintupled Qswitched NdYAG laser λ=213 nm exhibited that sharp peaks at around 312 eV emerged above excitation powers of ∼7 MW/cm2 demonstrating lasing in the ZnO films These results represent that the process is a simple promising approach for fabricating ZnO of sufficient optical performance for use as ultraviolet UV light emitters and an alternative UV laser source both are key components in shortwavelength photonic devices
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