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Title of Journal: Appl Phys A

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Abbravation: Applied Physics A

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Springer-Verlag

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DOI

10.1007/978-3-319-17530-0_21

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1432-0630

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Effect of metals on UVexcited plasmonic lithograp

Authors: K V Sreekanth V M Murukeshan
Publish Date: 2010/05/26
Volume: 101, Issue: 1, Pages: 117-120
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Abstract

This paper describes and compares the effect of metal films such as aluminum Al and silver Ag on UVexcited twobeam surface plasmon interference nanolithography A planar fourlayer configuration has been employed to study the light intensity distribution on the recording medium It is observed that highdensity sub50 nm periodic structures were achievable by employing the abovementioned metal films when interrogated with ppolarized 364 nm illumination wavelength source It is found that the obtained periodic feature shows good exposure depth and high contrast when Al is used as a metal film The initial experimental result of planar fourlayer configuration is also presented

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