Authors: Zhiya Dang Agnieszka Banas Sara Azimi Jiao Song Mark Breese Yong Yao Shuvan Prashant Turaga Gonzalo RecioSánchez Andrew Bettiol Jeroen Van Kan
Publish Date: 2013/05/31
Volume: 112, Issue: 3, Pages: 517-523
Abstract
A 3D silicon micromachining method based on proton beam writing combined with electrochemical anodization of ptype silicon enables fabrication of midinfrared photonic crystals made of silicon and porous silicon Here example structures of silicon 1D and 2D photonic crystals are demonstrated Progress and problems of fabricating 3D photonic crystals made of silicon are discussed The strategy of fabricating photonic crystals purely made of porous silicon and the characterization method of all these midinfrared structures are discussed Due to the flexibility of this fabrication method photonic devices and integrated photonic circuits may be built on a single chip for which two 2D silicon photonic crystals with one on top of the other are demonstrated
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