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Title of Journal: Appl Phys A

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Abbravation: Applied Physics A

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Springer-Verlag

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DOI

10.1016/0375-9601(75)90765-3

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1432-0630

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Largearea growth of vertically aligned ZnO pillar

Authors: JH Huang CY Wang CP Liu WH Chu YJ Chang
Publish Date: 2007/03/15
Volume: 87, Issue: 4, Pages: 749-753
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Abstract

A new method for fabricating largearea wellaligned ZnO pillars solely using radiofrequency magnetron sputtering is reported A mixture of argon and hydrogen gases was used as the plasma source acting as a reduction agent The ZnO pillars grow from a ZnO buffer layer with a ZnMgO nucleation stabilization layer on top with the sputtered targets sharing the same composition The entire growth is well controlled and linear A shadowing effect is also responsible for the growth The characteristics of the developed method are high uniformity and reproducibility as commonly known for sputtering which are vital prerequisites for future developments of nanodevices

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