Authors: Takuya Nobuta Toshio Ogawa
Publish Date: 2009/04/01
Volume: 44, Issue: 7, Pages: 1800-1812
Abstract
When the depth profile of chemical composition is studied with Xray photoelectron spectroscopy XPS the Ar+ ion sputtering method is generally adopted However in the case of polymers chemical composition is destroyed and so it is impossible to obtain accurate depth profile on polymers In this research the depth profile XPS analysis of aliphatic polymers aromatic polymers fluorine containing polymers and natural polymers were conducted with the sputtering source being C60+ ion and the degree of damage was examined while comparing the results with the case of conventional Ar+ ion It was found that Ar+ ion induces significant carbonization in all the polymers abovementioned Meanwhile it turned out that C60+ ion causes little damage to most polymers However in the case of the nonaromatic polymers containing halogen hydroxyl carboxyl and ether groups in their backbones the following three damage modes were found 1 the functional group ratio changes by over ±10 2 new functional groups are formed 3 the above 1 and 2 phenomena occur simultaneously
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